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PEALD (Plasma-Enhanced Atomic Layer Deposition)

Specifications

Gases Flow Type

  : Lateral type

Available Film

  : Metal oxide thin film based O2 plasma & H2O, Metal thin film base H2 plasma

Substrate Size & Temperature

  : 25 ~ 400 [℃] ± 1 [%] On The Substrate of 150x150[mm²]

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PLD (Pulsed Laser Deposition)

Specifications

Uniformity Zone of Substrate Heating

  :Ø15 mm

Substrate Temperature

  : 850°C ± 5°C in oxygen

Operating Pressure

  : 0.01 mTorr ~ 10 Torr

Target Carousel

  : one inch (25.4mm) diameter for four targets

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RF & DC Sputtering System

(KVS-2000)

 

Specifications

PROCESS CHAMBER
MATERIAL : SUS 304
SIZE : Φ265 X 300(H)
2.75" CF FLANGE FOR GAUGE & GAS & EXTRA PORT
1.33" CF FLANGE FOR SHUTTER PORT
 


VACUUM PUMPING UNIT
TURBO PUMP & ROTARY VACUUM PUMP
SUBSTRATE UNIT
MAX TEMPERATURE : UP TO 7
50℃
SUBSTRATE HOLDER : 3.5" SUS


SPUTTERING GUN SOURCE
MAGNET : Nd-Fe-B
N TYPE POWER CONNECTOR
R.F POWER SUPPLY & DC POWER SUPPLY 

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Probe Station

Specifications

Temperature: ~ 850 °C

Cryostat: ~ 4 K

Fiber: 300 ~ 1400nm Waverlength

RF: ~ 67GHz

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AFM (Atomic Force Microscope)

  
Specifications

 Position sensitive quadrant photo detector optimized for laser wavelength.

 <25 fm/Hz½ noise floor (noise level: 0.02 nm), Modular, flexible design to include optional modes

50 mm range, 250 nm resolution motorized Z Stage
76 mm range, 50 nm resolution motorized XY Stage

 Contact, Dynamic, EFM, PFM, CAFM, KFM modes

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PECVD (Plasma-Enhanced CVD)

Specifications

Base pressure : ~10(-6) Torr

· Gas : Ar, O2, N2

 Max, temp : about 1,100 degree C

Power : RF(13.56MHz, 600W)

System control by touch panel

Automatic Pressure control

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Mist-CVD (Chemical Vapor Deposition)

Specifications

Pump : Rotary Oil pump

Base pressure : ~10(-3) Torr

 Max, temp : about 1,100 degree C

Heating method : Furnace

Gas : Ar, N2

Pressure control : Manual Throttle valuve

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Semiconductor Analyzer (keithley 2635b)

Specifications

single-channel model with 30W power output

4 quadrant source/measure with 6-digit resoulution

Max/min voltage: 200 V / 100 nV

Max/min current: 1.5 A DC, 10 nA pulse/100 fA

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Water Splitting Device

Specifications

solar simulator

a 150 W Xenon lamp

potentiostat (VSP-300, Biologic)

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Lock-in Amplifier

1 mHz to 102.4 kHz range

>100 dB dynamic reserve

5 ppm/°C stability

0.01 degree phase resolution

Time constants from 10 µs to 3 ks
(up to 24 dB/oct rolloff)

Auto-gain, -phase, -reserve & -offset

Reference source

GPIB and RS-232 interfaces

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Furnace

Temperature: ~ 850 °C

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